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JAPANESE JOURNAL OF APPLIED PHYSICS

2023年12月最新中科院分区表数据已经更新,欢迎查询! 如果您对期刊系统有任何需求或者问题,欢迎点击此处反馈给我们。

按期刊名首写字母查看 JPN J APPL PHYS最新评论:整体审稿速度挺快 (2023-11-08)


期刊名:   ISSN:   研究方向:   影响因子: -   SCI收录:
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JAPANESE JOURNAL OF APPLIED PHYSICS期刊基本信息Hello,您是该期刊的第143463位访客

基本信息 登录收藏
期刊名字JAPANESE JOURNAL OF APPLIED PHYSICSJAPANESE JOURNAL OF APPLIED PHYSICS

JPN J APPL PHYS
(此期刊被最新的JCR期刊SCIE收录)

LetPub评分
5.9
60人评分
我要评分

声誉
6.5

影响力
4.7

速度
9.2

期刊ISSN0021-4922
微信扫码收藏此期刊
E-ISSN1347-4065
2022-2023最新影响因子
(数据来源于搜索引擎)
1.5 点击查看影响因子趋势图
实时影响因子 截止2023年12月27日:1.287
2022-2023自引率26.70%点击查看自引率趋势图
五年影响因子1.3
h-index 116
CiteScore
CiteScoreSJRSNIPCiteScore排名
3.000.3640.656
学科分区排名百分位
大类:Engineering
小类:General Engineering
Q2115 / 302
大类:Engineering
小类:General Physics and Astronomy
Q2105 / 240

期刊简介
The Japanese Journal of Applied Physics (JJAP) is an international journal for the advancement and dissemination of knowledge in all fields of applied physics. JJAP is a sister journal of the Applied Physics Express (APEX) and is published by IOP Publishing Ltd on behalf of the Japan Society of Applied Physics (JSAP).

JJAP publishes articles that significantly contribute to the advancements in the applications of physical principles as well as in the understanding of physics in view of particular applications in mind. Subjects covered by JJAP include the following fields:

• Semiconductors, dielectrics, and organic materials
• Photonics, quantum electronics, optics, and spectroscopy
• Spintronics, superconductivity, and strongly correlated materials
• Device physics including quantum information processing
• Physics-based circuits and systems
• Nanoscale science and technology
• Crystal growth, surfaces, interfaces, thin films, and bulk materials
• Plasmas, applied atomic and molecular physics, and applied nuclear physics
• Device processing, fabrication and measurement technologies, and instrumentation
• Cross-disciplinary areas such as bioelectronics/photonics, biosensing, environmental/energy technologies, and MEMS
期刊官方网站http://jjap.jsap.jp/
期刊投稿网址http://jjap.jsap.jp/authors/submission.html
期刊语言要求经LetPub语言功底雄厚的美籍native English speaker精心编辑的稿件,不仅能满足JAPANESE JOURNAL OF APPLIED PHYSICS的语言要求,还能让JAPANESE JOURNAL OF APPLIED PHYSICS编辑和审稿人得到更好的审稿体验,让稿件最大限度地被JAPANESE JOURNAL OF APPLIED PHYSICS编辑和审稿人充分理解和公正评估。LetPub的专业SCI论文编辑服务(包括SCI论文英语润色同行资深专家修改润色SCI论文专业翻译SCI论文格式排版专业学术制图等)帮助作者准备稿件,已助力全球15万+作者顺利发表论文。部分发表范例可查看:服务好评 论文致谢
提交文稿
是否OA开放访问No
通讯方式JAPAN SOC APPLIED PHYSICS, KUDAN-KITA BUILDING 5TH FLOOR, 1-12-3 KUDAN-KITA, CHIYODA-KU, TOKYO, JAPAN, 102-0073
出版商Japan Society of Applied Physics
涉及的研究方向物理-物理:应用
出版国家或地区JAPAN
出版语言English
出版周期Monthly
出版年份0
年文章数 895点击查看年文章数趋势图
Gold OA文章占比6.48%
研究类文章占比:
文章 ÷(文章 + 综述)
94.64%
WOS期刊SCI分区
2022-2023年最新版
WOS分区等级:4区

按学科分区JIF分区JIF排名JIF百分位
学科:PHYSICS, APPLIED
类别:SCIE
Q4130/159
中科院《国际期刊预警
名单(试行)》名单
2024年02月发布的2024版:不在预警名单中

2023年01月发布的2023版:不在预警名单中

2021年12月发布的2021版:不在预警名单中

2020年12月发布的2020版:不在预警名单中
中科院SCI期刊分区
2023年12月最新升级版
点击查看中科院SCI期刊分区趋势图
大类学科小类学科Top期刊综述期刊
物理与天体物理 2区4区4区
PHYSICS, APPLIED
物理:应用
1区2区4区
中科院SCI期刊分区
2022年12月升级版
大类学科小类学科Top期刊综述期刊
物理与天体物理 1区4区3区
PHYSICS, APPLIED
物理:应用
3区3区4区
中科院SCI期刊分区
2021年12月旧的升级版
大类学科小类学科Top期刊综述期刊
物理与天体物理 3区4区2区
PHYSICS, APPLIED
物理:应用
2区4区4区
SCI期刊收录coverage Science Citation Index Expanded (SCIE) (2020年1月,原SCI撤销合并入SCIE,统称SCIE)
Scopus (CiteScore)
PubMed Central (PMC)链接http://www.ncbi.nlm.nih.gov/nlmcatalog?term=0021-4922%5BISSN%5D
平均审稿速度网友分享经验:
平均2.0个月
平均录用比例网友分享经验:
66%
LetPub助力发表经LetPub编辑的稿件平均录用比例是未经润色的稿件的1.5倍,平均审稿时间缩短40%。众多作者在使用LetPub的专业SCI论文编辑服务(包括SCI论文英语润色同行资深专家修改润色SCI论文专业翻译SCI论文格式排版专业学术制图等)后论文在JAPANESE JOURNAL OF APPLIED PHYSICS顺利发表。
快看看作者怎么说吧:服务好评 论文致谢
期刊常用信息链接
同领域相关期刊 JAPANESE JOURNAL OF APPLIED PHYSICS期刊近年CiteScore指标趋势图
该杂志的自引率趋势图 JAPANESE JOURNAL OF APPLIED PHYSICS中科院SCI期刊分区趋势图
该杂志的年文章数趋势图 同领域作者分享投稿经验
JAPANESE JOURNAL OF APPLIED PHYSICS上中国学者近期发表的论文  
  • 同领域相关期刊
  • 期刊CiteScore趋势图
  • 期刊自引率趋势图
  • 中科院SCI期刊分区趋势图
  • 年文章数趋势图
  • 该期刊中国学者近期发表论文
  • 中科院SCI期刊分区相关期刊
  • 同类著名期刊名称 h-index CiteScore
    APPLIED PHYSICS LETTERS4016.40
    JOURNAL OF PHYSICS D-APPLIED PHYSICS1725.90
    JOURNAL OF APPLIED PHYSICS2945.10
    METROLOGIA673.20
    Applied Physics Express795.60
    PHYSICA C-SUPERCONDUCTIVITY AND ITS APPLICATIONS792.90
    REVIEW OF SCIENTIFIC INSTRUMENTS1453.10
    JOURNAL OF RESEARCH OF THE NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY512.90
    EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS441.90
    HIGH TEMPERATURE251.70
    中科院SCI期刊分区同大类学科的热搜期刊 浏览次数
    APPLIED PHYSICS LETTERS1033358
    OPTICS EXPRESS837954
    JOURNAL OF APPLIED PHYSICS617844
    PHYSICAL REVIEW LETTERS546058
    OPTICS LETTERS500942
    OPTICS AND LASER TECHNOLOGY491378
    OPTIK484779
    AIP Advances420909
    OPTICS COMMUNICATIONS416571
    JOURNAL OF PHYSICS D-APPLIED PHYSICS410651
  •  

    JAPANESE JOURNAL OF APPLIED PHYSICS JAPANESE JOURNAL OF APPLIED PHYSICS
    我来预测明年:
    稳步上升 表现平稳 逐渐下降  刷新
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  • 中国学者近期发表的论文
    1.Core and filamentary damage of fused silica induced by nanosecond laser at 1064 nm

    Author: Zhang, Fawang; Wang, Biyi; Liu, Xinyi; Xu, Man; Liu, Hufeng; Miao, Xinxiang; Lu, Tao; Qiu, Rong; Guo, Decheng; Zhou, Qiang; Jiang, Yong
    Journal: JAPANESE JOURNAL OF APPLIED PHYSICS. 2023; Vol. 62, Issue 1, pp. -. DOI: 10.35848/1347-4065/aca3e4
        DOI
    2.Improved performance of enhancement-mode GaN MIS-FET based on a self-terminating gate recess etching technique with in situ NH3 pre-treatment

    Author: Zhang, Bin; Wang, Jinyan; Li, Mengjun; Huang, Chengyu; He, Jiayin; Wang, Xin; Wang, Chen; Wang, Hongyue; Mo, Jianghui; Wang, Maojun; Wu, Wengang
    Journal: JAPANESE JOURNAL OF APPLIED PHYSICS. 2023; Vol. 62, Issue 1, pp. -. DOI: 10.35848/1347-4065/aca3e3
        DOI
    3.2D scalar wave modelling of apodized RF BAW resonators for transverse mode analysis

    Author: Wu, Ting; He, Yi-wen; Wong, Yu-po; Li, Wuping; Bao, Jing-fu; Hashimoto, Ken-ya
    Journal: JAPANESE JOURNAL OF APPLIED PHYSICS. 2023; Vol. 62, Issue 1, pp. -. DOI: 10.35848/1347-4065/aca5d8
        DOI
    4.Electrical and optical properties of highly crystalline W-VO2 nano-films prepared by thermal oxidation of V-WO3 precursors

    Author: Luo, Jie; Gong, Mengtao; Tian, Shouqin; Zhou, Lincan; Zheng, Tao; Zhao, Xiujian; Liu, Baoshun
    Journal: JAPANESE JOURNAL OF APPLIED PHYSICS. 2023; Vol. 62, Issue 1, pp. -. DOI: 10.35848/1347-4065/acae68
        DOI
    5.Investigation of PVT variation on single-event transient effect assisted with hardened layout techniques

    Author: Liang, Bin; Luo, Deng; Sun, Qian; Chen, Yanrong; Zhang, Kangkai; Chen, Wangyong
    Journal: JAPANESE JOURNAL OF APPLIED PHYSICS. 2023; Vol. 62, Issue 1, pp. -. DOI: 10.35848/1347-4065/aca7a6
        DOI
    6.TO1 soft mode in Fe doped beta-Ga2O3 studied by terahertz time-domain spectroscopy

    Author: Jiang, Hao; Wang, Ke; Gong, Chen; Murakami, Hironaru; Tonouchi, Masayoshi
    Journal: JAPANESE JOURNAL OF APPLIED PHYSICS. 2023; Vol. 62, Issue 1, pp. -. DOI: 10.35848/1347-4065/acae52
        DOI
    7.Influence of anti-phase surface relief structure on optical mode and laser output power for 450 nm GaN-based VCSELs

    Author: Gao, Yuanbin; Chu, Chunshuang; Hang, Sheng; Zhang, Yonghui; Zhou, Jianwei; Zhang, Zi-Hui
    Journal: JAPANESE JOURNAL OF APPLIED PHYSICS. 2023; Vol. 62, Issue 1, pp. -. DOI: 10.35848/1347-4065/acaba0
        DOI
    8.Heterogeneous integration of lithium tantalate thin film on quartz for high performance surface acoustic wave resonator

    Author: Chen, Yang; Wu, Jinbo; Zhao, Xiaomeng; Li, Zhongxu; Ke, Xinjian; Zhang, Shibin; Zhou, Min; Huang, Kai; Ou, Xin
    Journal: JAPANESE JOURNAL OF APPLIED PHYSICS. 2023; Vol. 62, Issue 1, pp. -. DOI: 10.35848/1347-4065/aca5d7
        DOI
    9.Effect of RF power and gas ratio on the sidewall of beta-Ga2O3 films via inductively coupled plasma etching

    Author: Bian, Chunxu; Zhang, Xiaodong; Tang, Wenbo; Zhang, Li; Ma, Yongjian; Chen, Tiwei; Zhou, Xin; Li, Botong; Tang, Jilong; Zeng, Zhongming; Zhang, Baoshun
    Journal: JAPANESE JOURNAL OF APPLIED PHYSICS. 2023; Vol. 62, Issue 1, pp. -. DOI: 10.35848/1347-4065/acb40e
        DOI
    10.The impacts of localized backside etching on proton radiation response in SOI passive devices

    Author: Zhao, Biyao; Bi, Jinshun; Ma, Yue; Zhang, Jian; Wang, Yan; Fan, Linjie; Han, Tingting; Xuan, Yundong; Stempitsky, Viktor; Liu, Mengxin
    Journal: JAPANESE JOURNAL OF APPLIED PHYSICS. 2023; Vol. 62, Issue 2, pp. -. DOI: 10.35848/1347-4065/acb40f
        DOI
  • 同大类学科的其他著名期刊名称 h-index CiteScore
    REVIEWS OF MODERN PHYSICS29891.50
    Living Reviews in Relativity7565.50
    Living Reviews in Relativity065.50
    Nature Reviews Physics044.10
    Nature Photonics26659.30
    Annual Review of Astronomy and Astrophysics16859.60
    PHYSICS REPORTS-REVIEW SECTION OF PHYSICS LETTERS24852.30
    Advances in Optics and Photonics5148.80
    ASTRONOMY AND ASTROPHYSICS REVIEW5447.10
    Annual Review of Condensed Matter Physics5147.00
    同分区等级的其他期刊名称 h-index CiteScore
    HARVARD BUSINESS REVIEW02.40
    QJM-AN INTERNATIONAL JOURNAL OF MEDICINE1086.10
    Energy Material Advances08.50
    CLINICAL AND EXPERIMENTAL HYPERTENSION453.60
    Journal of Public Transportation07.00
    Asian Journal of Psychiatry010.90
    Chinese Journal of Population Resources and Environment02.60
    VIEW08.60
    HLA933.00
    INTERNATIONAL JOURNAL OF SOCIAL PSYCHIATRY011.50


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